1、chemical vapor deposition reactor
2、plasma chemical vapor deposition
3、modified chemical vapor deposition
4、metallo organic chemical vapor deposition
5、laser induction chemical vapor deposition method
6、Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
7、The carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).
8、Fabrication of transparent conductive AZO (ZnO:Al) film by plasma enhanced chemical vapor deposition
9、photochemical vapor deposition oxide
10、Structural changes in carbon produced by a sulfur-aided catalytic chemical vapor deposition
11、Synthesis of mesoporous nitrogen-doped carbon nanoparticles by detonation-assisted chemical vapor deposition
12、The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
13、The results show: the amorphous hydrogenated carbon film can be fabricated on PET surface by plasma-enhanced chemical vapor deposition.
14、SiN thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) under various power and pressure conditions.
15、Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film.
16、Ir films were prepared by metal-organic chemical vapor deposition (MOCVD) method using iridium tri-acetylacetonate precursors on molybdenum substrates.
17、The device structure is optimized firstly, then the structure is grown by metal organic chemical vapor deposition (MOCVD).
18、Plasma enhanced chemical vapor deposition (PECVD) is one of the matured and simple manipulated among the thin film deposition methods at low temperature.
19、The article has introduced the application and development tendency of techniques of film making with chemical vapor deposition in all fields.
20、Synthesis of high purity multi-walled carbon nanotubes over Co-Mo/MgO catalyst by the catalytic chemical vapor deposition of methane
21、Without doping, plasma enhanced chemical vapor deposition (PECVD) of silica films on si substrates with gas mixtures of SiH_4 and N_2O is considered.
22、Template growth of gallium nitride nanowires was demonstrated by metal organic chemical vapor deposition (MOCVD) with carbon nanotubes as templates in this paper.
23、This symmetric growth mode is induced by the shape changes in copper nanocrystals during catalyzing the chemical vapor deposition of acetylene.
24、When chemical vapor deposition is used to grow graphene it is normally made up of individually grown sheets that bloom in the outward direction from hot catalysts until they meet each other.
25、为了生产强大到可以驱动显示的可弯曲晶体管序列，工程师们使用了一种称为“化学气相沉积”(chemical vapor deposition)的流程。
